PURPOSE: To obtain films free from dust pickup by constituting the above device it such a manner that the soaring up of dust is lessened and clean gases come into contact with substrates in the case of evacuation of chambers 1 to a vacuum from the atm. pressure or conversely in the case of the restoration of the atm. pressure from the vacuum.

CONSTITUTION: This inline sputtering device is constituted by providing discharge holes 8 in the parts of the chambers 1 facing the margin parts leaving the parts of trays 3 to be imposed with the substrates 4 of the loading chamber and unloading chambers of the device and providing vent ports 9 to the parts of the chambers 1 facing the substrates 4.