PURPOSE: To obtain the thin film having stable characteristic values by providing prescribed shielding parts in a substrate aperture and the front and rear of a transporting direction on a jig for holding and transporting substrates which is freely movably disposed in a transporting section so that the invariable state of plasma can be maintained at the time of film formation.

CONSTITUTION: This inline type film forming device is formed of a hermetic vessel 1, the transporting section 2 and the jig 3 for transportation which is freely movably disposed in this transporting section and holds and transports the substrates P. The jig 3 for transportation has the substrate aperture 30 holding the above-mentioned substrates P and has the shielding parts 31a to 31b which have the width exceeding the width of the aperture 30 at the front and rear of the transporting direction of the aperture 30 and cover the aperture 30. The above-mentioned hermetic vessel 1 has a releasing device 11 which releases a thin-film material M. The above-mentioned transporting section 2 is communicated with the above-mentioned hermetic vessel 1 in the film forming aperture 20 through which the above mentioned material M passes.