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Title:
INORGANIC PARTICLE SLURRY
Document Type and Number:
Japanese Patent JP2014172914
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an inorganic particle slurry that is excellent in storage stability and excellent in stability of particle size distribution.SOLUTION: The inorganic particle slurry contains a polymerized product comprising as polymerization components (1) an ethylenically unsaturated monomer having a phosphoric acid group and/or (2) an ethylenically unsaturated monomer having an alkylene oxide chain. As the monomer (1), for example, an ethylene glycol methacrylate phosphate, a propylene glycol methacrylate phosphate and the like are given. As the monomer (2), for example, a polyalkylene glycol mono(meth)acrylate and the like are given.

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Inventors:
TANAKA KENJI
Application Number:
JP2013043625A
Publication Date:
September 22, 2014
Filing Date:
March 06, 2013
Export Citation:
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Assignee:
KIWA KAGAKU YAKUHIN KK
International Classes:
C08J3/07; C08F20/28
Domestic Patent References:
JP2010505969A2010-02-25
JP2008291242A2008-12-04
JP2007153637A2007-06-21
JP2003286434A2003-10-10
JP2004068149A2004-03-04
JP2009132952A2009-06-18
Foreign References:
US20030144399A12003-07-31
Attorney, Agent or Firm:
Shoji Okamoto



 
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