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Title:
INSERTION LIGHT SOURCE HAVING RADIATION RESISTANCE CHARACTERISTICS
Document Type and Number:
Japanese Patent JP3652927
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To enhance radiation and charged particle beam resistance characteristics and easily form required magnetic field distribution by installing a space between magnet lines, arranged so as to face magnet line formed by arranging rare earth permanent magnets whose magnetizing direction varies periodically, and arranging SmCo base sintered magnets at the ends of a magnet line formed by arranging NdFeB base sintered magnets.
SOLUTION: An insertion light source is formed by arranging SmCo-based magnets at the ends of magnet lines where electrode go in and out, and arranging NdFeB-based magnets in portions other than the ends, where magnetic field distribution become a periodical magnetic field. Since the NdFeB-based magnet easily causes demagnetization due to charged particle and the SmCo base magnet rarely causes demagnetization, the SmCo base magnet is used at the ends having high probability of irradiation of radiation or charged particle beams. Use of 2-17 type SmCo base magnet, having holding force mechanism by magnetic domain wall pinning and having both radiation characteristics several steps higher than 1-5 type SmCo-based magnet is preferable as the SmCo-based magnet.


Inventors:
Ken Ohashi
Application Number:
JP20035599A
Publication Date:
May 25, 2005
Filing Date:
July 14, 1999
Export Citation:
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Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G21K1/093; H05H13/04; (IPC1-7): H05H13/04; G21K1/093
Domestic Patent References:
JP9204998A
JP9092498A
JP8255726A
JP10012399A
JP9190770A
JP64072502A
JP4073989A
JP62081958A
JP8340651A
JP4085600U
Attorney, Agent or Firm:
Kanji Arai
Eiichiro Shimazaki



 
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