ION BEAM EXPOSING AND DEVELOPING PROCESS

Title:

ION BEAM EXPOSING AND DEVELOPING PROCESS

Document Type and Number:

Japanese Patent JPS617629

Kind Code:

A

Abstract:

PURPOSE:To perform exposure and development simultaneously by means of removing an organic film on a substrate as shown in figure. CONSTITUTION:The surface of organic film 2 coated on a substrate 1 is supplied with O2 while being irradiated by O ion or Ga ion. Through these procedures, a groove 3 is formed as shown in figure by means of supplying the organic film 2 with O ion for oxidation making it feasible to perform exposure and development simultaneously.

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Inventors:

IWAMATSU SEIICHI

Application Number:

JP12823384A

Publication Date:

January 14, 1986

Filing Date:

June 21, 1984

Export Citation:

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Assignee:

SUWA SEIKOSHA KK

International Classes:

G03F7/20; H01L21/027; (IPC1-7): G03F7/20; H01L21/30

Attorney, Agent or Firm:

Kisaburo Suzuki (1 outside)

Next Patent: 建築物の配管施工法