PURPOSE: To enable to draw out ions with high luminance unobtainable by a conventional ion source device even from a low energy ion beam by heightening strength of an electric field.
CONSTITUTION: Ions 4 generated by discharge or the like are accelerated between an acceleration electrode 1 and an electron deterrent electrode 2 and retarded between the electron deterrent electrode 2 and an outlet electrode 3 while being drawn out with the fixed energy. The strength of an electric field between said electron deterrent electrode 2 and the outlet electrode 3 is made to be not less than 6kV/mm. The density of an ion current generated in the ion generation part 5, the potential between the acceleration electrode 1 and the electron deterrent electrode 2 and the distance between the acceleration electrode 1 and the electron deterrent electrode 2 and fixed. Said required strength of the electric field can be obtained by regulating the distance between the electron deterrent electrode 2 and the outlet electrode 3.
WO/2016/084162 | ION BEAM DEVICE |
JP3742638 | Electron flood device and ion implanter |
JP2005174569 | ION SOURCE DEVICE AND MANUFACTURING METHOD OF ELECTRONIC COMPONENT |
SUGAWARA TOORU
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