Title:
LAPPING DEVICE FOR IMPROVING SURFACE OF ARTICLE
Document Type and Number:
Japanese Patent JPS6215072
Kind Code:
A
Abstract:
A lapping device for surface enhancement of bulk material including a treatment chamber which is closed gas-tight and is charged with an inert gas, at least one vibratory conveyor being arranged in the treatment chamber and an arrangement for creating motion between a lapping abrasive liquid and the goods on the conveyor to form a surface enhancement for the goods. The arrangement for creating motion can be either abrasive nozzles for creating a jet of abrasive material directed onto the goods, the movement of the vibratory conveyor through a bath of the lapping abrasive or a combination of both. The lapping device is particularly useful for pretreatment of bulk goods which are to be electro-plated.
Inventors:
BIRKLE SIEGFRIED (DE)
GEHRING JOHANN (DE)
GEHRING JOHANN (DE)
Application Number:
JP15951686A
Publication Date:
January 23, 1987
Filing Date:
July 07, 1986
Export Citation:
Assignee:
SIEMENS AG
International Classes:
B24B31/073; B24B31/06; C25D5/34; (IPC1-7): B24B31/06
Attorney, Agent or Firm:
Tomimura Kiyoshi