PURPOSE: To obtain an apparatus, which can sufficiently form a desired deposit by one laser light source and can contrive to make a deposition speed higher and deposition more efficient by equipping an apparatus with a permeability variable optical system for half-splitting a single reaction-exciting laser light vertically and horizontally relative to a substrate and for applying the light to the substrate.
CONSTITUTION: In a laser CVD apparatus for applying laser light to a raw material gas introduced into a reaction chamber 9 to subject the raw material gas to decomposition reaction and to deposit reaction chemical species generated from the raw material gas from a vapor phase on a substrate 8 placed in the reaction chamber 9 to grow a desired thin film, the apparatus is equipped with a permeability variable optical system 15 for half-splitting a single reaction-exciting laser light vertically and horizontally relative to the substrate 8 and for applying the light to the substrate 8. For example, a permeability variable optical system 15 for half-splitting laser light generated from a laser oscillator 1 and for changing the amount of energy of the half-split laser light in the manner of corresponding to a reaction time is provided and the half-split laser light is converged by a converging optical system 4, adjusted in energy density and guided to the reaction chamber 9.
OMINE MEGUMI
DOI MAKOTO
Next Patent: BACK PROJECTION TYPE IMAGE DISPLAY DEVICE