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Title:
LIQUID CRYSTAL DISPLAY DEVICE OF ACTIVE MATRIX SYSTEM AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3926879
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To prevent the defect of gate metallic layer generated when the layer is exposed to a photoresist developer by having a stage for forming a thin first anodically oxidized layer on patterned metals and a stage for forming a second anodically oxidized layer on this first anodically oxidized layer, etc.
SOLUTION: An Al layer is deposited over the entire surface of a glass substrate 121 and gate bus wiring pads, gate bus wirings 113 and gate electrodes 103 are patterned. The gate bus wiring pads, the gate bus wirings 113 and the gate electrodes 103 branched from the gate wiring to be formed are simultaneously patterned. Next, the first anodically oxidized layer 131 of the thickness below a prescribed value is formed on the patterned Al layer. The second anodically oxidized layer 132 is formed on the first anodically oxidized layer 131 exclusive of the gate bus wiring pads and holding capacitors. A protective mask is formed to prevent the formation of the second anodically oxidized layer 132 on the gate bus wiring pads and the holding capacitor electrodes during this stage.


Inventors:
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Application Number:
JP7908097A
Publication Date:
June 06, 2007
Filing Date:
March 13, 1997
Export Citation:
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Assignee:
LJ Phillips LCD Company Limited
International Classes:
G02F1/1343; G02F1/1368; G02F1/133; G02F1/1333; G02F1/136; G02F1/1362; H01L21/336; H01L29/786; (IPC1-7): G02F1/136; G02F1/1343; H01L29/786; H01L21/336
Domestic Patent References:
JP7245404A
JP1274116A
JP8334782A
JP4178634A
JP6027486A
JP7230102A
JP5323356A
JP7015017A
JP7245405A
JP4152325A
JP58093092A
Attorney, Agent or Firm:
Isamu Watanabe
Shintaro Hotta
Ryoji Kosugi
Tomohiro Mori
Tetsuya Hirosawa
Sonoda Yoshitaka