PURPOSE: To prevent the domain of a titled element which is induced when said element is left in an atmosphere of high temperature and high humidity, the occurrence of air bubbles, breakdown of a transparent electrode which is caused when the DC voltage is applied, by forming a ground film composed of a metallic oxide with specific thickness on a glass substrate.

CONSTITUTION: A ground film of a metallic oxide with ≥3,000 thickness is formed on a glass substrate. For instance, soda glass substrates 1 and 1' are dipped into a solution of silicon hydroxide and then burnt at 150°C. Thus a silicon oxide film of about 1,500 is obtained. This film is dipped again into the above-mentioned solution and then burnt at 500°C to obtain the silicon oxide films 6 and 6' of about 3,000. The transparent electrodes 2 and 2' are formed on the films 6 and 6', and the organic liquid crystal orientation controlling films 3 and 3' of 1,000 are provided on the electrodes 2 and 2' and up to the outside of the seal. Thus a whole structure is obtained. Then the liquid crystal is enclosed, and the peripheral area of the liquid crystal is sealed by a sealing material 5. In such a way, a liquid crystal display element is obtained.