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Title:
LIQUID GROWTH BY SOLVENT OF SB
Document Type and Number:
Japanese Patent JPH01205521
Kind Code:
A
Abstract:

PURPOSE: To form an avalanche photodiode for long-wavelength light detection use whose ionization coefficient of a hole is large and whose noise is little by a method wherein a solvent of Sb is used as a raw material solution and a GaAs substrate plane is set to (111)B.

CONSTITUTION: A substrate plane of a GaAs substrate is set to (111)B. A solvent of Sb is used as a raw material solution. By using this raw material solution, a semiconductor layer containing Ga and Sb is grown on the GaAs substrate by a liquid epitaxial growth method. Because a growth operation is executed under a condition that Sb exists excessively in this manner, the occurrence of a vacant lattice point on the Sb side is reduced; a concentration value of a hole in a growth layer is lowered sharply.


Inventors:
TANAHASHI TOSHIYUKI
KUWAZUKA HARUHIKO
NISHIYAMA SOICHI
Application Number:
JP3131288A
Publication Date:
August 17, 1989
Filing Date:
February 12, 1988
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
H01L21/208; (IPC1-7): H01L21/208
Attorney, Agent or Firm:
Sadaichi Igita



 
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