Title:
LIQUID MATERIAL VAPORIZATION SUPPLY DEVICE
Document Type and Number:
Japanese Patent JP3296611
Kind Code:
B2
Abstract:
PURPOSE: To eliminate inconveniences occurring when the pressure of the downstream side of a vaporizer is reduced in a liquid material vaporization supply device in a system for directly vaporizing a liquid material.
CONSTITUTION: The supply device is provided with a vaporizer 1 for vaporizing a liquid material LS which is introduced inside by heating and for leading a carrier gas CG which is separately introduced into the inside of the gas G which is generated due to vaporization toward the outside. A flow rate control valve 4 for adjusting the flow rate of the liquid material LS which is introduced into the vaporizer 1 is provided as close as possible and the flow rate control valve 4 is provided with shut-off function and at the same time it is cooled.
Inventors:
Takeshi Kohno
Kouichi Ishikawa
Kouichi Ishikawa
Application Number:
JP1793193A
Publication Date:
July 02, 2002
Filing Date:
January 09, 1993
Export Citation:
Assignee:
STEC Co., Ltd.
International Classes:
G01N1/22; B01J4/00; B01J7/02; H01L21/31; (IPC1-7): G01N1/22; B01J4/00; B01J7/02
Domestic Patent References:
| JP445838A | ||||
| JP6391128A | ||||
| JP57165737A | ||||
| JP60132639A | ||||
| JP5460224A | ||||
| JP6442U | ||||
| JP5659134U |
Attorney, Agent or Firm:
Hideo Fujimoto