Title:
LIQUID TREATMENT SYSTEM
Document Type and Number:
Japanese Patent JP2016080492
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a liquid treatment system capable of preventing dust from coming into the system and preventing an operator from being exposed to a harmful substance while securing the visibility and workability in the system.SOLUTION: The liquid treatment system includes: a liquid storage unit for storing liquid used in an analyzer; a liquid treatment mechanism for performing a treatment using the liquid in a vessel placed in the liquid storage unit; a liquid treatment space 8 that includes the liquid storage unit and liquid treatment mechanism and has an opening surface; and an air curtain formation mechanism including a plurality of exhaust nozzles 20a for jetting air in one direction and an intake port for sucking the air jetted from the exhaust nozzles so that air flows in one direction on the whole of the opening surface of the liquid treatment space.SELECTED DRAWING: Figure 1
Inventors:
OKOBA TSUTOMU
Application Number:
JP2014211481A
Publication Date:
May 16, 2016
Filing Date:
October 16, 2014
Export Citation:
Assignee:
SHIMADZU CORP
International Classes:
G01N1/00; G01N1/10
Attorney, Agent or Firm:
Shigeo Noguchi