To continuously measure the positions of a first substrate stage and a second substrate stage, in a lithographic apparatus for confining a liquid in a space between a final element of a projecting system and a substrate.
The lithographic apparatus includes the first and second substrate stages, and is configured and arranged so as to cooperate in performing a joint movement for making the lithographic apparatus transit from a first arrangement in which the liquid is confined between a first substrate held by the first substrate stage and the final element, to a second arrangement in which the liquid is confined between a second substrate held by the second substrate stage and the final element. In this way, during the joint movement, the liquid is essentially confined within the space with respect to the final element. The lithographic apparatus also includes a position measurement system configured, at least during the joint movement, to measure the positions of the first and second substrate stages.
COPYRIGHT: (C)2007,JPO&INPIT
VAN DER PASCH ENGELBERTUS ANTO
Shinji Oga
Toshifumi Onuki
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