To provide a lithography device including a projection optical system for suppressing upsizing of an original plate due to upsizing of the device.
The device includes a projection optical system 10 which has a first concave reflecting surface M11, a convex reflecting surface M12, and a second concave reflecting surface M13 arranged in order on an optical path from an object plane P1 to an image plane P2. The exposure device includes a refracting optical member L13 disposed between the first concave reflecting surface M11 and the convex reflecting surface M12 and refracting optical members L11, L12, and L14 disposed in an optical path from the object plane P1 to the first concave reflecting surface M12 and an optical path from the second concave reflecting surface M13 to the image plane P3. An image magnification being a magnification factor of an image area of the image plane to the object plane satisfies 1.12.0. At least one of a paraxial curvature center C1 of the first concave reflecting surface M11, a paraxial curvature center of the convex reflecting surface M12, and a paraxial curvature center C3 of the second concave reflecting surface exists between the object plane P1 and the image plane P2.
FUKAMI SEIJI
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Next Patent: MULTIBEAM SCANNING METHOD AND MULTIBEAM SCANNING OPTICAL SYSTEM