Title:
フィードフォワード焦点制御を有するリソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4381325
Kind Code:
B2
Abstract:
The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system (IL) configured to provide a beam of radiation (PB), a first support structure (MT) configured to support a patterning device (MA) that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure (WT) that includes a substrate holder for holding a substrate (W), a projection system (PL) configured to project the patterned beam of radiation onto a target portion (C) on a surface of the substrate, and a servo unit (PW) configured to position the substrate holder. The apparatus further includes a sensor unit (LS) configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane (REF), a memory unit configured to store surface information of the substrate based on respective distances of corresponding the at least one location point on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.
Inventors:
Hans Butler
Marx Emil Johannes Boonman
Petrus marinus christianus maria van den biggerard
Marx Emil Johannes Boonman
Petrus marinus christianus maria van den biggerard
Application Number:
JP2005040321A
Publication Date:
December 09, 2009
Filing Date:
February 17, 2005
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20; G03F9/00
Domestic Patent References:
| JP2002246309A | ||||
| JP10070175A | ||||
| JP2001355669A | ||||
| JP2001168000A | ||||
| JP2000036531A |
Foreign References:
| US6618120 | ||||
| US20010002303 |
Attorney, Agent or Firm:
Sakaki Morishita