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Title:
METHOD FOR PRODUCING CoCrPt-SIO2 SPUTTERING TARGET FOR DEPOSITING MAGNETIC RECORDING FILM
Document Type and Number:
Japanese Patent JP2006176808
Kind Code:
A
Abstract:

To provide a method for producing a CoCrPt-SiO2 sputtering target with a fine structure for depositing a magnetic recording film applied to a high density magnetic recording medium for a hard disk, particularly, for depositing a CoCrPt-SiO2 granular magnetic recording film applied to a perpendicular magnetic recording medium.

The method for producing a CoCrPt-SiO2 sputtering target for depositing a magnetic recording film is provided by which a powdery mixture obtained by mixing Pt powder and fine SiO2 powder is subjected to calcining treatment thereby producing Pt-SiO2 calcining-treated powder, and the Pt-SiO2 calcining-treated powder is blended with Cr powder and Co powder, they are mixed, and the obtained powdery mixture is subjected to pressure sintering.


Inventors:
NONAKA SOHEI
SHIRAI TAKANORI
SUGIUCHI YUKIYA
Application Number:
JP2004369401A
Publication Date:
July 06, 2006
Filing Date:
December 21, 2004
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
C23C14/34; B22F3/10; C22C19/07; G11B5/851
Attorney, Agent or Firm:
Kazuo Tomita
Kutaro Kamoi