PURPOSE: To provide a Josephson junction element excellent in performance allowing easy and accurate fine processing of a junction part, and a manufacturing method thereof.
CONSTITUTION: A normal conductor layer 12 and the superconductor layers 13, 13' are by turns laminated on a substrate 11 and a photoresist layer is formed thereon followed by etching so as to expose the superconductor layers 13, 13' of the prescribed regions. Then, metal vapor is fed from the direction inclined to the photoresist side to the normal lines of the faces of the superconductor layers 13, 13' so as to perform vapor deposit the metal layers 14, 14' on the region excepting the regions on the superconductor layers 13, 13' ranging over a prescribed width from an etching end face of the photoresist layer while going through the superconductor layers 13, 13' by a prescribed width and having the metal layers 14, 14' as masks so as to form a groove 15 reaching the inside of the normal conductor layer 12 in order to manufacture a Josephson junction element.
| JPH07211949 | INTEGRATED CIRCUIT DEVICE |
| JPS6199394 | TUNNEL JUNCTION TYPE JOSEPHSON ELEMENT |
| JPS5917099 | [Title of the device] Memory cell |
FUJIMOTO MANABU
NOJIMA HIDEO
KOBA MASAYOSHI
