Title:
MANUFACTURE OF COMPOUND THIN FILM
Document Type and Number:
Japanese Patent JPH05166727
Kind Code:
A
Abstract:
PURPOSE: To provide a method for preparing a flat high-quality chalcopylite thin film which has a composition with constituents of stoichiometric ratio, suppresses substrate-thin film counter diffusion, and keeps grain growth of III group elements uniformed and suppressed with regard to a method for preparing a chalcopylite thin film.
CONSTITUTION: In the case of depositing a chalcopylite thin film on a substrate 23 by vacuum vapor deposition or sputter vapor deposition, at the same time it is irradiated with ions containing III group elements to prepare a chalcopylite thin film 28.
Inventors:
YOSHIDA TETSUHISA
NEGAMI TAKAYUKI
WADA TAKAHIRO
HIRAO TAKASHI
NEGAMI TAKAYUKI
WADA TAKAHIRO
HIRAO TAKASHI
Application Number:
JP33650391A
Publication Date:
July 02, 1993
Filing Date:
December 19, 1991
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
C23C14/06; C23C14/28; C23C14/34; H01L21/203; H01L21/265; H01L31/04; (IPC1-7): C23C14/06; C23C14/28; C23C14/34; H01L21/203; H01L21/265; H01L31/04
Attorney, Agent or Firm:
Akira Kobiji (2 outside)