Title:
MANUFACTURE OF INTEGRATED CIRCUIT
Document Type and Number:
Japanese Patent JPH022171
Kind Code:
A
Abstract:
PURPOSE: To enable demarcation of a field implanting region by forming another mask on a mask used to form a field oxide region overlapping so as to be protruded to the sides. CONSTITUTION: An oxidation prevention mask 11 is formed on a substrate 10 and a mask made of a photo resist product such as a resin 20 is formed by photo etching. The mask 20 is not removed but cured under, e.g. an ultraviolet ray. A resin 22 used for a second etching process is depositted so as to be protruded from the mask 11. Then the masks 11, 22 are used to produce a field implanting region 12. The manufacturing process after the masks 22, 20 has been removed is the same as in a conventional method.
Inventors:
FUIRITSUPU BOABAN
Application Number:
JP31483088A
Publication Date:
January 08, 1990
Filing Date:
December 13, 1988
Export Citation:
Assignee:
SGS THOMSON MICROELECTRONICS
International Classes:
H01L21/266; H01L21/762; H01L21/82; H01L21/8234; H01L27/088; H01L21/76; H01L29/78; (IPC1-7): H01L21/76; H01L27/08; H01L27/088; H01L29/78; H01L29/784
Attorney, Agent or Firm:
Tadahiko Ito (2 outside)
Next Patent: JPH022172