Title:
MANUFACTURE OF MASK FOR EXPOSURE AND ITS DEVICE
Document Type and Number:
Japanese Patent JPH10319571
Kind Code:
A
Abstract:
To provide a method for manufacturing mask for exposure in a short period of time with high reliability.
Data division not affecting the pattern of an exposing mask is instructed, the instruction data containing a prescribed index code are retrieved from layout data and a file is generated (S21). Then, the layout data are divided in accordance with this file (S22) and corresponding processing 27, 37, 47 are performed selectively in accordance with conditions regarding the respective divided layout data. Thus, generated EB files 26, 36, 46 are integrated based on the file and a plotting job is generated (S28).
Inventors:
ASHIDA ISAO
Application Number:
JP13145497A
Publication Date:
December 04, 1998
Filing Date:
May 21, 1997
Export Citation:
Assignee:
SONY CORP
International Classes:
G03F1/68; G03F1/70; G06F7/60; G06F17/50; G21K5/10; H01L21/02; H01L21/027; (IPC1-7): G03F1/08; G06F17/50; H01L21/027
Attorney, Agent or Firm:
Takahisa Sato
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