Title:
MANUFACTURE OF OPTICAL ELEMENT AND ILLUMINATION DEVICE FORMED BY USING THIS OPTICAL ELEMENT
Document Type and Number:
Japanese Patent JP3287236
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a process for manufacturing high-performance binary type diffraction optical elements by adequately setting the etching rate adequately and suppressing the influence of the alignment errors of masks, and an illumination device formed by using this optical element.
SOLUTION: This process for manufacturing the optical elements consists in manufacturing the optical elements by successively subjecting substrates to repetition of N times of a series of processes including resist coating applying, exposure transfer of patterns on the masks, development processing, etching and resist removing. The error quantity of the relative alignment of the mask used in the k-th time of the exposure transfer before the start of the k-th (2≤k≤N) time of the etching processing and the mask used in the (k-1)th time the exposure transfer is determined and the k-th time of the etching quantity is determined according to the determined alignment error quantity.
Inventors:
Yasuyuki Unno
Application Number:
JP28183096A
Publication Date:
June 04, 2002
Filing Date:
October 03, 1996
Export Citation:
Assignee:
Canon Inc
International Classes:
G02B5/18; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): G02B5/18; H01L21/027
Domestic Patent References:
| JP7191209A | ||||
| JP8108475A | ||||
| JP815509A | ||||
| JP5326365A | ||||
| JP5505474A |
Attorney, Agent or Firm:
Yukio Takanashi
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