Title:
MANUFACTURE OF PATTERN
Document Type and Number:
Japanese Patent JPH05251847
Kind Code:
A
Abstract:
PURPOSE: To lower heating temperature and to sharpen a provided pattern by letting electrodeposition resin contain a compound, which lowers the temperature of deblocking for block isocyanate, or processing this resin with that compound. CONSTITUTION: A metal pattern is produced on a substrate, having a surface composed of exposed metal in a planned region and a metal covered with a resist in the remaining region. As a thermosetting polymer layer having isocyanate group and reactive blocked isocyanate group, the thermosetting polymer layer containing the component which has two kinds of groups selected out at least from among hydroxyl group, amino group and carboxyl group in the electrodeposition layer is electrodeposited on the exposed metal, so that the exposed metal may be protected. The resist is heated for applying resistivity with respect to a removable solvent to the electrodeposition layer. Further, the metal in the remaining region is exposed, and the metallic pattern protected by the electrodeposition polymer layer can remain.
Inventors:
KURISUTOFUAA POORU BANKUSU
Application Number:
JP19490992A
Publication Date:
September 28, 1993
Filing Date:
June 29, 1992
Export Citation:
Assignee:
CIBA GEIGY AG
International Classes:
C09D5/44; G03F7/40; H05K3/06; G03F7/26; H05K3/28; H05K3/00; (IPC1-7): H05K3/06; C09D5/44; G03F7/26; H05K3/28
Attorney, Agent or Firm:
Nobuo Kaida (2 outside)