Title:
MANUFACTURE OF THIN FILM SOLAR CELL
Document Type and Number:
Japanese Patent JPS63147374
Kind Code:
A
Abstract:
PURPOSE:To eliminate thermal damage to thin films in the case of patterning by a method wherein, after the various thin films for constituting a thin film solar cell are formed on a supporting substrate, the thin films are selectively peeled off by an ultrasonic processing needle. CONSTITUTION:Various thin films for constituting a thin film solar cell are formed on a supporting substrate 1, then the above thin films are selectively peeled off by an ultrasonic processing needle 5. For example, a transparent electrode layer 2 is formed on the glass substrate 1 by a vacuum deposition and so on. Then, the ultrasonic processing needle 5 connected to an ultrasonic oscillator is applied to the film surface and is made to shift while being made to oscillate and the transparent electrode layer 2 is continuously peeled off and patterned linearly. Moreover, an amorphous Si layer 3, which is used as a photoelectric conversion layer, is formed thereon by laminating in order a P-type layer and an N-type layer in such a way that a P-I-N junction is formed by a plasma CVD method and so on. Then, the amorphous Si layer 3 is shaved by the ultrasonic processing needle 5 like the pattern of the transparent electrode layer 2 and the amorphous Si layer 3 is formed on the transparent electrode layer 2.
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Inventors:
OSAWA MICHIO
ARITA TAKASHI
HANABUSA AKIRA
MORI KOSHIRO
AOKI HIROMICHI
ARITA TAKASHI
HANABUSA AKIRA
MORI KOSHIRO
AOKI HIROMICHI
Application Number:
JP29524886A
Publication Date:
June 20, 1988
Filing Date:
December 11, 1986
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
H01L31/04; H01L21/302; H01L21/3065; H01L21/461; H01L27/142; (IPC1-7): H01L21/461; H01L31/04
Attorney, Agent or Firm:
Toshio Nakao