Title:
MANUFACTURING DEVICE FOR CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD FOR THE SEMICONDUCTOR SUBSTRATE
Document Type and Number:
Japanese Patent JPH11176792
Kind Code:
A
Abstract:
To provide a manufacturing device for cleaning liquid for semiconductor substrate that adequately maintains its cleaning capability.
The manufacturing device for cleaning liquid for semiconductor substrate is provided with an ozone gas generating section 2, a dilute hydrofluoric acid supply section 3, and an ozone gas dissolution section 3 that is connected to the ozone gas generating section 2 and the dilute hydrofluoric acid supply section 3 and directly dissolves an ozone gas supplied from the ozone gas generating section 2 into a dilute hydrofluoric acid supplied from the dilute hydrofluoric acid supply section 3.
Inventors:
KUNIYASU HITOSHI
Application Number:
JP33838797A
Publication Date:
July 02, 1999
Filing Date:
December 09, 1997
Export Citation:
Assignee:
SONY CORP
International Classes:
H01L21/304; (IPC1-7): H01L21/304; H01L21/304
Attorney, Agent or Firm:
Kuninori Funabashi