Title:
MANUFACTURING METHOD OF ELECTRON-BEAM EXPOSURE RESIST USE HIGH MOLECUL AR MATERIALS
Document Type and Number:
Japanese Patent JPS524833
Kind Code:
A
Abstract:
PURPOSE: A manufacturing method of polyalkylmethacrylate without elution of the position being not exposed yet and disturbances due to the selective absorption of solvent or good quality when developing.
Inventors:
FUJISHIGE SHIYOUEI
Application Number:
JP8132275A
Publication Date:
January 14, 1977
Filing Date:
June 30, 1975
Export Citation:
Assignee:
KOGYO GIJUTSUIN
International Classes:
G03F7/004; C08J3/00; G03C1/72; G03F7/038; G03F7/039; G03G5/00; H01L21/027; H01L21/312; H05K3/00; (IPC1-7): G03C1/72; G03F7/10; G03G5/00; H01L21/312; H05K3/00
Domestic Patent References:
| JPS4947081A | 1974-05-07 |