Title:
MANUFACTURING METHOD AND PROGRAM OF PHOTOMASK
Document Type and Number:
Japanese Patent JP2010044289
Kind Code:
A
Abstract:
To provide a multiply-exposing technique that can prevent the processes from becoming complicated when forming mask patterns and efficiently form the mask patterns of the even shape conforming the design data.
In the target design data 101, the multiply-exposing mask patterns are formed by carrying out a process of disposing auxiliary patterns 105 virtually connecting the tips 103a, 104a of a pair of the line design patterns 103, 104 facing each other with a predetermined space in between at the tips 103a, 104a in the design data.
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Inventors:
NITANI HIROTAKA
Application Number:
JP2008209314A
Publication Date:
February 25, 2010
Filing Date:
August 15, 2008
Export Citation:
Assignee:
FUJITSU MICROELECTRONICS LTD
International Classes:
G03F1/36; G03F1/68; G03F1/70; H01L21/027; H01L21/28; H01L21/336; H01L21/76; H01L29/78
Attorney, Agent or Firm:
Takayoshi Kokubun
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