Title:
MASK FOR EVANESCENT LIGHT EXPOSURE, ITS PRODUCTION AND EVANESCENT LIGHT EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JPH11218901
Kind Code:
A
Abstract:
To provide a mask for evanescent light exposure which enables fine processing of an object to be exposed, a process for producing the same and an evanescent light exposure device therefor.
A metallic layer 203 is formed on the surface of a mask base material 201 and thereafter, a minute opening 204 is formed on the surface of this metallic layer 203 by a scanning type probe microscope 220. As a result, the mask for evanescent light exposure built up with the minute opening 204 to a projecting shape from the surface of the metallic layer 203 is obtd.
Inventors:
IKEDA TSUTOMU
KURODA AKIRA
KURODA AKIRA
Application Number:
JP1945098A
Publication Date:
August 10, 1999
Filing Date:
January 30, 1998
Export Citation:
Assignee:
CANON KK
International Classes:
G03F1/00; G03F1/70; G03F7/20; H01L21/027; (IPC1-7): G03F1/08; G03F7/20; H01L21/027
Attorney, Agent or Firm:
Tadashi Wakabayashi (4 others)
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