Title:
MASK, EXPOSURE DEVICE USING THE SAME AND PRODUCTION OF DEVICE
Document Type and Number:
Japanese Patent JP3267471
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To sharpen the intensity distribution shape of exposing light to be absorbed in a resist and to obtain a mask with which an improvement in exposure resolution is possible by varying the thickness of a transmission body formed with mask patterns according to the patterns.
SOLUTION: The front surface of a membrane 1 is provided with absorbers 2 which are transfer patterns and phase shifts 3 on both sides thereof. Differences in level provided with holes 4 in the positions corresponding to these phase shifters 3 are formed on the rear surface of this membrane 1. The membrane 1 is so formed as to nearly satisfy the relations tm=±ks×λ/(2× km×δs-ks×δm)), ts=±km×λ/(2×(ks×δm-km×δs)) (double signs in the same order) where the difference in level of the parts varying in the thickness of the membrane 1 is defined as tm, the thickness of the phase shifters 3 as ts, the complex refractive index of the membrane 1 as 1-δm-ikm, the complex refractive index of the phase shifters 3 as 1-δs-iks and the wavelength of radiation as A.
Inventors:
Akira Miyake
Keiko Chiba
Keiko Chiba
Application Number:
JP19754395A
Publication Date:
March 18, 2002
Filing Date:
August 02, 1995
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F1/22; G03F1/68; G21K1/10; H01L21/027; (IPC1-7): H01L21/027; G03F1/08; G03F1/16
Domestic Patent References:
| JP4316047A | ||||
| JP7104456A | ||||
| JP2158121A | ||||
| JP6292438A | ||||
| JP415909A |
Attorney, Agent or Firm:
Keizo Nishiyama (1 person outside)