Title:
MASK FOR EXPOSURE
Document Type and Number:
Japanese Patent JPH05134389
Kind Code:
A
Abstract:
PURPOSE: To provide a chromeless mask possible to transfer a pattern without reflecting a shape on the terminal part.
CONSTITUTION: The 1st 90°C phase shifter layer 5 is formed on a transparent substrate 1 and the 2nd 90° phase shifter layer 2 is formed on the surface except terminal part of the phase shifter layer 5. And phase of incident light is shifted by 180° on an exposure end face of the 1st and 2nd phase shifter layer 5, 2 and phase quantity in the terminal part of the 2nd shifter 2 is reduced.
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Inventors:
MARIA OPU DE BETSUKU
HANAWA TETSUO
HANAWA TETSUO
Application Number:
JP32812491A
Publication Date:
May 28, 1993
Filing Date:
November 14, 1991
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G03F1/34; G03F1/68; G03F7/20; H01L21/027; (IPC1-7): G03F1/08; G03F7/20; H01L21/027
Attorney, Agent or Firm:
Kenichi Hayase