MASK RING ASSEMBLY FOR X-RAY LITHOGRAPHY

Title:

MASK RING ASSEMBLY FOR X-RAY LITHOGRAPHY

Document Type and Number:

Japanese Patent JPS60160618

Kind Code:

A

Abstract:

This invention is directed to a mask ring assembly for X-ray lithography which is particularly adapted, among other possible uses, for use in replicating integrated circuit patterns, said assembly including a mask ring, a plurality of kinematic mounts for removably mounting the mask ring on an alignment cartridge, each of the kinematic mounts including a funnel-like shaped seat member and a mating ball-like shaped member, one of said members being on the mask ring and the other of the members being mounted on the alignment cartridge.

Inventors:

UOREN DESUKENOKUSU
GUREGORII HIYUUZU
JIYASUTEIN KUROITSUAA
KARURO RA FUIANDORA

Application Number:

JP26585A

Publication Date:

August 22, 1985

Filing Date:

January 07, 1985

Export Citation:

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Assignee:

PERKIN ELMER CORP

International Classes:

H01L21/027; G03F1/22; G03F7/20; G03F9/00; H01L21/30; (IPC1-7): G03F7/20; H01L21/30

Attorney, Agent or Firm:

Toshio Yano (1 outside)

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Next Patent: JPS60160619