To provide a measuring instrument capable of preventing the decline of measurement accuracy due to a luminous flux transmitted through a light shielding part without increasing the thickness of a mask including an opening and the light shielding part in the measurement of a light intensity distribution on a measuring object surface.
The exposure apparatus is the measuring instrument for measuring the light intensity distribution formed by the luminous flux made incident on the measuring object surface and includes: a sensor unit provided with the mask including the opening having a dimension shorter than the wavelength of the luminous flux and the light shielding part, a first photoelectric conversion element for receiving the luminous flux which has passed through the opening and outputting light intensity signals, and a second photoelectric conversion element arranged at a position separated from the first photoelectric conversion element for receiving the luminous flux transmitted through the light shielding part and outputting light intensity signals; a driving part for driving the sensor unit; and a signal processing part for calculating the light intensity distribution on the basis of the light intensity signals outputted from the first photoelectric conversion element and the light intensity signals outputted from the second photoelectric conversion element.
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu