To provide a member, to be used for a plasma treatment device (plasma cleaning device, ashing device, sputtering device and the like) in manufacturing a semiconductor or the like, in which wearing is remarkably decreased and particle generation caused by contact with plasma is also reduced.

The present invention relates to a member for vacuum device coated, on its surface, with a corrosion-resistant glass spraying film comprised of at least Si, O, 3a base element or 2A base and Zr. Said member improves corrosion resistance for plasma and reduces particle generation. Such a corrosion-resistant member can be manufactured by spraying, to a base material, a powder mixing a silicon-nitride, silica and 3a base oxide powder and a zirconia powder.