METHOD OF CLEANING EQUIPMENT SURFACES IN SEMICONDUCTOR MATERIAL PROCESSING CHAMBER

Title:

METHOD OF CLEANING EQUIPMENT SURFACES IN SEMICONDUCTOR MATERIAL PROCESSING CHAMBER

Document Type and Number:

Japanese Patent JP2005210130

Kind Code:

A

Abstract:

To provide a method of cleaning equipment surfaces in a semiconductor material processing chamber, after deposition of a porous film containing a porogen in the processing chamber.

The method is comprised of contacting the equipment surfaces in the semiconductor material processing chamber with a proton donor containing an atmosphere to make it react with the porogen deposited on the equipment surfaces; contacting the equipment surfaces with a fluorine donor containing atmosphere, to make it react with the thin film deposited on the equipment surfaces.

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Inventors:

JOHNSON ANDREW DAVID
DHEANDHANOO SEKSAN
BITNER MARK DANIEL
VRTIS RAYMOND NICHOLAS

Application Number:

JP2005015810A

Publication Date:

August 04, 2005

Filing Date:

January 24, 2005

Export Citation:

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Assignee:

AIR PROD & CHEM

International Classes:

C23C16/00; B08B3/00; B08B6/00; B08B7/00; B08B9/08; C23C16/44; C23G3/00; C25F1/00; H01L21/304; H01L21/31; (IPC1-7): H01L21/31; C23C16/44; H01L21/304

Attorney, Agent or Firm:

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Masaya Nishiyama

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