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Patent Searching and Data


Title:
METHOD FOR DEVELOPING PHOTORESIST AND ITS APPARATUS
Document Type and Number:
Japanese Patent JPS63318554
Kind Code:
A
Abstract:

PURPOSE: To always enable the constant development of the titled photoresist, even in the case of change in the composition of a developer by finishing the development at the time when the extinction of the developer is increased by a prescribed amount, by dissolving a photoresist in the developer.

CONSTITUTION: The developing tank 1 is constituted of a light shielding material, and a cell 8 protruding to out side is provided at a part of said tank, and a spectrophotometer 9 capable of detecting the extinction of the developer 2 is provided within the cell 8. When the photoresist is dipped in the developer 2, and the extinction of the developer 2 which changes due to the dissolution of the photoresist increases to the prescribed value, the development of the objective material 5 to be developed, is finished.


Inventors:
KONDO YUJI
SAKAI NOBUHIKO
Application Number:
JP15348687A
Publication Date:
December 27, 1988
Filing Date:
June 22, 1987
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G03F7/30; (IPC1-7): G03C5/24; G03F7/00
Attorney, Agent or Firm:
Masataka Kobayashi