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Title:
METHOD AND DEVICE FOR DEFECT INSPECTION
Document Type and Number:
Japanese Patent JP2002032736
Kind Code:
A
Abstract:

To inspects a work where the same pattern is repeated, with high precision without large memory capacity even if the pattern array is asymmetrical.

When an inspection image inputted by picking up an image of an object to be inspected having the same pattern formed repeatedly is processed to inspect a defect of the pattern, a binary image is generated by binarizing the inspection image with a specific threshold, the center of gravity of each isolated area in the binary image is calculated, and an object nearby area of fixed size including the isolated area is cut out around each center of gravity (mark '+'). Then respective nearby areas are exclusively ORed having their centers of gravity met. Here, (A) is normal and (B) to (D) are defective.


Inventors:
HAYASHI KENTA
SOEDA MASAHIKO
NISHIDA MASASHI
HATA NAOKI
Application Number:
JP2000215611A
Publication Date:
January 31, 2002
Filing Date:
July 17, 2000
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G01B11/24; G01M11/00; G01N21/956; G06T1/00; G06T7/60; H01J9/50; (IPC1-7): G06T1/00; G01B11/24; G01N21/956; G06T7/60; H01J9/50
Domestic Patent References:
JPH06274629A1994-09-30
JPH06273141A1994-09-30
JPH03194946A1991-08-26
JPH0921757A1997-01-21
JPH11230722A1999-08-27
JPH1187446A1999-03-30
JPS62212506A1987-09-18
JPH03194945A1991-08-26
JPH01307875A1989-12-12
JPH0894534A1996-04-12
JPH10260022A1998-09-29
JP2000002526A2000-01-07
JPS62130343A1987-06-12
JPH0520445A1993-01-29
JPH0483107A1992-03-17
Attorney, Agent or Firm:
Satoshi Takaya (2 outside)



 
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