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Title:
METHOD FOR FABRICATING NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE
Document Type and Number:
Japanese Patent JP2009033205
Kind Code:
A
Abstract:

To solve a problem of degrading in light extraction efficiency of a nitride semiconductor light-emitting device, which problem is caused by optical reflection or a crushed layer produced in machining a substrate that is hard to process, thereby enhancing the light extraction efficiency of the nitride semiconductor light-emitting device.

A method for fabricating the nitride semiconductor light-emitting device including a substrate and a nitride semiconductor layer which contains a light-emitting layer stacked on the substrate, includes a first step of removing at least part of the nitride semiconductor layer by laser so as to form a separation groove thereon; a second step of subjecting the side face of the nitride semiconductor layer along the separation groove to wet-etching treatment; and a third step of dividing the substrate along the separation groove.


Inventors:
URASHIMA YASUHITO
KUSUKI KATSUTERU
Application Number:
JP2008279055A
Publication Date:
February 12, 2009
Filing Date:
October 30, 2008
Export Citation:
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Assignee:
SHOWA DENKO KK
International Classes:
H01L33/06; H01L21/306; H01L33/10; H01L33/32
Domestic Patent References:
JP2006253670A2006-09-21
JP2003347589A2003-12-05
JPH11505666A1999-05-21
JP2000068608A2000-03-03
JP2001085736A2001-03-30
JP2005012206A2005-01-13
JPH10341035A1998-12-22
Attorney, Agent or Firm:
Yukio Uchida