PURPOSE: To form a superfine annular pattern of a submicron order by irradiating coherent light from the vertex side of conical refracting body to a photosensitive film in the center axial direction of the cone through the cone.
CONSTITUTION: The photosensitive film 2 consisting of photoresist is applied and baked on a disk type substrate 1. Coherent light is irradiated to the surface of the photosensitive film 2 through the conical refracting body 3 consisting of a transparent member. When parallel light is irradiated from the vortex side of the body 3 in the center axial direction, the rays of light are refracted symmetrically right and left about the center axis in all sections including the center axis. Therefore, concentrical annular interference stripes are formed on the surface of the photosensitive film 2. The interference stripes are developed to obtain a fine annular pattern due to the ruggedness of the photoresist.
KATO MASAYUKI
IKEDA HIROYUKI
INAGAKI YUSHI
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