Title:
METHOD OF FORMING MICROMINIATURE STRUCTURE
Document Type and Number:
Japanese Patent JPH06188175
Kind Code:
A
Abstract:
PURPOSE: To provide a method of forming a microminature structure having grooves with inclined side walls.
CONSTITUTION: A resist layer 10 formed on a substrate 9 is exposed to synchrotron radiation through a mask 8 whose surface is provided with absorber 7 having inclined side edges 7a. The exposed resist layer 10 is developed to obtain a resist pattern 11 having openings. A material is deposited on the substrate 1 so that the openings may be filled.
Inventors:
OGINO SEIJI
Application Number:
JP34018092A
Publication Date:
July 08, 1994
Filing Date:
December 21, 1992
Export Citation:
Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
B81C1/00; G03F1/00; H01L21/027; (IPC1-7): H01L21/027; G03F1/00
Attorney, Agent or Firm:
Fukami Hisaro (3 outside)
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