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Title:
METHOD FOR FORMING PARTICULATE-ADSORBED PATTERN AND PARTICULATE-ADSORBED PATTERN-FORMED MATERIAL
Document Type and Number:
Japanese Patent JP2004267857
Kind Code:
A
Abstract:

To provide a method for forming a particulate-adsorbed pattern, by which the uniform particulate-adsorbed pattern so firm that the formed pattern can not be peeled off by a mechanical operation such as rubbing can be formed on a substrate only in the desired region by a simple operation and which is applicable even when the large-sized pattern is formed and to provide a particulate-adsorbed pattern-formed material formed by using this method.

This particulate-adsorbed pattern-formed material is formed by the method comprising a step to imagewisely form the region having polymerization initiating ability on the surface of the substrate , a step to produce a graft polymer having a nonionic polar group in the region by atom transfer radical polymerization and a step to make particulate adsorbed on the produced graft polymer.


Inventors:
KAWAMURA KOICHI
Application Number:
JP2003059575A
Publication Date:
September 30, 2004
Filing Date:
March 06, 2003
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
B01J20/26; B01J20/30; C08F291/00; C08F292/00; (IPC1-7): B01J20/26; B01J20/30; C08F291/00; C08F292/00
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda