Title:
離型層の形成方法およびシリコンインゴットの製造方法
Document Type and Number:
Japanese Patent JP4624178
Kind Code:
B2
Inventors:
Shigeru Goto
Application Number:
JP2005157077A
Publication Date:
February 02, 2011
Filing Date:
May 30, 2005
Export Citation:
Assignee:
Kyocera Corporation
International Classes:
B22C3/00; B22D25/04
Domestic Patent References:
| JP2002321037A | ||||
| JP2002239682A |