Title:
METHOD FOR HOUSING AND SUPPLYING B2H6 GAS, AND EQUIPMENT THEREFOR
Document Type and Number:
Japanese Patent JP3117610
Kind Code:
B2
Abstract:
PURPOSE: To surely prevent the blocking of a pressure reducing valve by keeping the housing atmospheric temperature of a B2H6 (diborane) gas vessel to a specified temperature at the supply of B2H6 gas.
CONSTITUTION: In a B2H6 gas housing and supplying equipment 1 provided on a process for p-type silicon film formation or BSG film formation, a cooler (spot cooler) 2 is set, and an air duct 3 for the cooled air from the cooler 2 is arranged, so that the housing atmospheric temperature of a pressure reducing valve 7 provided in a B2H6 gas vessel 5 and a gas feed piping 12 can be regulated. Under the condition where the housing atmospheric temperature of the B2H6 gas vessel 5 is held lower than 25°C at gas feed, for example, regularly at 22°C, the B2H6 gas is supplied to a semiconductor manufacturing device. Thus, generation of a higher borane is prevented, and the blocking of the pressure reducing valve is prevented.
More Like This:
Inventors:
Koichi Yamagata
Hiroshi Hatakeyama
Nobuyuki Saito
Hiroshi Hatakeyama
Nobuyuki Saito
Application Number:
JP30475594A
Publication Date:
December 18, 2000
Filing Date:
December 08, 1994
Export Citation:
Assignee:
Kawasaki Steel Co., Ltd.
International Classes:
F17D1/02; F17C13/08; H01L21/205; H01L21/22; (IPC1-7): F17D1/02; F17C13/08; H01L21/205
Domestic Patent References:
| JP5283371A | ||||
| JP697086A | ||||
| JP633859B2 | ||||
| JP517520Y2 |
Attorney, Agent or Firm:
Eiichi Kobayashi