Title:
洗浄組成物及び半導体装置の製造方法
Document Type and Number:
Japanese Patent JP5513181
Kind Code:
B2
Inventors:
Tomotake Takahashi
Fushimi Hideo
Fushimi Hideo
Application Number:
JP2010056286A
Publication Date:
June 04, 2014
Filing Date:
March 12, 2010
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
H01L21/304; C11D7/06; C11D7/08; C11D7/10; C11D7/16; C11D7/26; C11D7/32; G03F7/42; H01L21/027
Domestic Patent References:
| JP2009212383A | ||||
| JP2008023753A1 | ||||
| JP2009278018A |
Attorney, Agent or Firm:
Yasuhiro Noguchi