Title:
洗浄剤組成物及び薄型基板の製造方法
Document Type and Number:
Japanese Patent JP6674628
Kind Code:
B2
Abstract:
A cleaner composition consisting essentially of (A) 90.0-99.9 wt% of an organic solvent and (B) 0.1-10.0 wt% of a C 3 -C 6 alcohol, and containing (C) 20-300 ppm of sodium and/or potassium is effective for cleaning a surface of a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.
Inventors:
Ueno Hoya
Hideyoshi Yanagisawa
Hideyoshi Yanagisawa
Application Number:
JP2016088020A
Publication Date:
April 01, 2020
Filing Date:
April 26, 2016
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C11D7/50; C11D7/06; C11D7/24; C11D7/26; C11D7/32
Domestic Patent References:
| JP2006343604A | ||||
| JP9057431A | ||||
| JP10176190A | ||||
| JP2006527783A |
Foreign References:
| WO2013187313A1 | ||||
| WO2015166826A1 | ||||
| US20150133356 | ||||
| US20140357052 | ||||
| US20040142835 |
Attorney, Agent or Firm:
Hideaki International Patent Office