To provide a method for manufacturing a film formed body by vapor deposition, by which an accuracy of a film thickness of a vapor deposition film is improved.

A vapor deposition apparatus and a member to be subjected to vapor deposition are prepared. The vapor deposition apparatus includes a vacuum chamber and a vapor deposition source. The vapor deposition source is installed within the vacuum chamber and evaporates a deposition material. After the vapor deposition apparatus and the member to be subjected to vapor deposition have been prepared, the member to be subjected to vapor deposition is housed within the vacuum chamber. After the member to be subjected to vapor deposition has been housed within the vacuum chamber, evacuation from an inside of the vacuum chamber is started and the inside of the vacuum chamber is made into a reduced pressure state. After the inside of the vacuum chamber has been made into the reduced pressure state, evaporation of the deposition material from the vapor deposition source is started and a vapor deposition film composed of the deposition material is formed on the member to be subjected to vapor deposition. After the evaporation of the deposition material from the vapor deposition source has been started, evaporation of the deposition material from the vapor deposition source is terminated. At the same time, the evacuation from the inside of the vacuum chamber is terminated and gas is introduced into the inside of the vacuum chamber to release the reduced pressure state.