Title:
ABRASIVE PAD AND POLISHED PRODUCT MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2022155532
Kind Code:
A
Abstract:
To provide an abrasive pad with excellent surface smoothness, and a polished product manufacturing method with use of the same.SOLUTION: An abrasive pad has a polyurethane sheet as a polishing layer, and an end point detection window provided at an opening of the polyurethane sheet. In dynamic viscoelasticity measurement performed under the conditions of a tension mode, a frequency of 1.0 Hz, 10 to 100°C, a storage elastic modulus E'W90 at 90°C is 1.0×107 Pa or more, a D hardness (DW80) of the end point detection window at 80°C is 40 or more, and a D hardness (DW20) of the end point detection window at 20°C is 40 to 90.SELECTED DRAWING: Figure 1
Inventors:
TATENO TEPPEI
ITOYAMA MITSUNORI
SEKIYA HITOSHI
KOIKE KENICHI
KURIHARA HIROSHI
YAMAGUCHI SATSUKI
TAKAMIZAWA YAMATO
ITOYAMA MITSUNORI
SEKIYA HITOSHI
KOIKE KENICHI
KURIHARA HIROSHI
YAMAGUCHI SATSUKI
TAKAMIZAWA YAMATO
Application Number:
JP2022047833A
Publication Date:
October 13, 2022
Filing Date:
March 24, 2022
Export Citation:
Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24B37/24; B24B37/013; H01L21/304
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito