Title:
METHOD OF MANUFACTURING REFLECTIVE LAYER-PHOSPHOR LAYER COATING SEMICONDUCTOR ELEMENT
Document Type and Number:
Japanese Patent JP2018006472
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method capable of simply manufacturing a reflective layer-phosphor layer coating semiconductor element.SOLUTION: A manufacturing method of a double layer coated element 1, comprises: a first step of arranging a plurality of optical semiconductor elements 3 on a temporary fixing sheet 2 while relatively having an interval along the longitudinal direction; a second step of continuously arranging a phosphor layer 4 so as to cover the plurality of optical semiconductor elements 3 along the longitudinal direction; a third step of removing the phosphor layer 4 in a space of the optical semiconductor elements 3 which is relatively adjacent in a longitudinal direction so as to be independently covered by one phosphor layer 4 for one optical semiconductor element 3, and forming a plurality of one layer coated elements 6; a fourth step of continuously arranging a reflective layer 7 along the longitudinal direction so as to cover the plurality of one layer coated elements 6; and a fifth step of cutting and dividing the reflective layer 7 and a phosphor layer front part 41 so as to pass through between a front edge of the optical semiconductor element 3 and the front edge of the phosphor layer front part 41 in each one layer coated element 6, and dividing into a plurality of two layer coated elements 1.SELECTED DRAWING: Figure 8
Inventors:
MATSUDA HIROKAZU
YOSHIDA NAOKO
NORO KOJI
YOSHIDA NAOKO
NORO KOJI
Application Number:
JP2016129056A
Publication Date:
January 11, 2018
Filing Date:
June 29, 2016
Export Citation:
Assignee:
NITTO DENKO CORP
International Classes:
H01L33/50; H01L33/54; H01L33/60
Attorney, Agent or Firm:
Hiroyuki Okamoto
Shinichi Uda
Shinichi Uda