Title:
細孔を有する構造体の製造方法及び細孔を有する構造体
Document Type and Number:
Japanese Patent JP3754876
Kind Code:
B2
Abstract:
A method of manufacturing a structure with pores which are formed by anodic oxidation and whose layout. pitch, position, direction, shape and the like can be controlled. The method includes the steps of: disposing a lamination film on a substrate, the lamination film being made of insulating layers and a layer to be anodically oxidized and containing aluminum as a main composition; and performing anodic oxidation starting from an end surface of the lamination film to form a plurality of pores having an axis substantially parallel to a surface of the substrate, wherein the layer to be anodically oxidized is sandwiched between the insulating layers, and a projected pattern substantially parallel to the axis of the pore is formed on at least one of the insulating layers at positions between the pores.
Inventors:
Toru Tada
Tatsuya Iwasaki
Tatsuya Iwasaki
Application Number:
JP2000201366A
Publication Date:
March 15, 2006
Filing Date:
July 03, 2000
Export Citation:
Assignee:
Canon Inc
International Classes:
C25D11/04; B01D67/00; B01D71/02; B81B1/00; C04B38/00; C25D11/20; H01L21/316; H01L29/06; H01L49/00
Domestic Patent References:
| JP10121292A | ||||
| JP11288785A | ||||
| JP11200090A | ||||
| JP9316692A |
Attorney, Agent or Firm:
Tokuhiro Watanabe
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