To provide a method of manufacturing a substrate, manufacturing a large-sized high-flatness substrate to be improved in surface roughness with high machining stability.
This method of manufacturing a substrate includes: a step (step S10) of filling a container of a polishing device with polishing liquid; a step (step S11) of immersing a workpiece in the polishing liquid; a step (step S12) of adjusting the attitude of the workpiece immersed in the polishing liquid; a step (step S13) of introducing air into the polishing liquid; a step (step S14) of measuring and changing the air pressure; a step (step S15) of measuring and changing the distance between a nozzle for jetting the air and the workpiece; and a step (step S17) of making adjustment such as (step S16) change in angle of causing the air to collide with the workpiece to polish the workpiece, and then taking the polished and manufactured substrate from the container.
ISONO YUICHI
OKAMOTO NAOYUKI
