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Patent Searching and Data


Title:
METHOD FOR MEASURING POSITION AND SEMICONDUCTOR EXPOSURE SYSTEM USING THE METHOD
Document Type and Number:
Japanese Patent JP2000275010
Kind Code:
A
Abstract:

To alleviate a measuring error by correcting one or both of mark and reference waveforms in response to a waveform difference between the mark and the reference waveforms.

One or both values of a mark waveform and a template waveform is corrected at a ratio responsive to positions so that a difference of the mark and the template waveforms becomes a minimum at each template position in a waveform correcting step. For example, one or both values of the mark and the template waveforms is corrected so that the difference of the mark and the template waveforms becomes a function approximated value by function approximating the difference of the mark and the template waveforms at the respective positions by using a least square approximation method or the like for the respective positions by a preset error function. After the correction, likelihood (degree of coincidence) of a center of the mark is repeatedly calculated in a preset mark position measuring range for the corrected mark waveform in a coincidence calculating step, and a change of the degree of the coincidence is calculated.


Inventors:
KOGA SHINICHIRO
Application Number:
JP8405299A
Publication Date:
October 06, 2000
Filing Date:
March 26, 1999
Export Citation:
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Assignee:
CANON KK
International Classes:
H01L21/027; G01B11/00; G03F9/00; (IPC1-7): G01B11/00; H01L21/027
Attorney, Agent or Firm:
Takanashi Yukio